<?xml version='1.0' encoding='UTF-8'?>
<OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd">
  <responseDate>2026-06-26T00:47:39Z</responseDate>
  <request verb="GetRecord" identifier="oai:materialscloud.org:2111" metadataPrefix="oai_dc">https://archive.materialscloud.org/oai2d</request>
  <GetRecord>
    <record>
      <header>
        <identifier>oai:materialscloud.org:2111</identifier>
        <datestamp>2024-03-26T09:43:32Z</datestamp>
        <setSpec>openaire_data</setSpec>
        <setSpec>community-mcarchive</setSpec>
      </header>
      <metadata>
        <oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
          <dc:contributor>Roisin, Nicolas</dc:contributor>
          <dc:contributor>Brunin, Guillaume</dc:contributor>
          <dc:contributor>Rignanese, Gian-Marco</dc:contributor>
          <dc:contributor>Flandre, Denis</dc:contributor>
          <dc:contributor>Raskin, Jean-Pierre</dc:contributor>
          <dc:contributor>Poncé, Samuel</dc:contributor>
          <dc:creator>Roisin, Nicolas</dc:creator>
          <dc:creator>Brunin, Guillaume</dc:creator>
          <dc:creator>Rignanese, Gian-Marco</dc:creator>
          <dc:creator>Flandre, Denis</dc:creator>
          <dc:creator>Raskin, Jean-Pierre</dc:creator>
          <dc:creator>Poncé, Samuel</dc:creator>
          <dc:date>2024-03-26</dc:date>
          <dc:description>Strain engineering is a widely used technique for enhancing the mobility of charge carriers in semiconductors, but its effect is not fully understood. In this work, we perform first-principles calculations to explore the variations of the mobility of electrons and holes in silicon upon deformation by uniaxial strain up to 2% in the [100] crystal direction. We compute the  π₁₁ and π₁₂ electron piezoresistances based on the low-strain change of resistivity with temperature in the range 200 K to 400 K, in excellent agreement with experiment. We also predict them for holes which were only measured at room temperature. Remarkably, for electrons in the transverse direction, we predict a minimum room-temperature mobility about 1200 cm²/Vs at 0.3% uniaxial tensile strain while we observe a monotonous increase of the longitudinal transport, reaching a value of 2200 cm²/Vs at high strain.  We confirm these findings experimentally using four-point bending measurements, establishing the reliability of our first-principles calculations. For holes, we find that the transport is almost unaffected by strain up to 0.3% uniaxial tensile strain and then rises significantly, more than doubling at 2% strain. Our findings open new perspectives to boost the mobility by applying a stress in the [100] direction. This is particularly interesting for holes for which shear strain was thought for a long time to be the only way to enhance the mobility.</dc:description>
          <dc:format>text/markdown</dc:format>
          <dc:format>application/zip</dc:format>
          <dc:identifier>https://doi.org/10.24435/materialscloud:hn-kj</dc:identifier>
          <dc:identifier>oai:materialscloud.org:2111</dc:identifier>
          <dc:identifier>mcid:2024.50</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:publisher>Materials Cloud</dc:publisher>
          <dc:relation>https://archive.materialscloud.org/communities/mcarchive</dc:relation>
          <dc:relation>https://doi.org/10.24435/materialscloud:2t-gn</dc:relation>
          <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
          <dc:rights>Creative Commons Attribution Non Commercial 4.0 International</dc:rights>
          <dc:rights>https://creativecommons.org/licenses/by-nc/4.0/legalcode</dc:rights>
          <dc:subject>silicon</dc:subject>
          <dc:subject>strain</dc:subject>
          <dc:subject>mobility</dc:subject>
          <dc:subject>piezoresistive</dc:subject>
          <dc:subject>first principles</dc:subject>
          <dc:title>Phonon-limited mobility for electrons and holes in highly-strained silicon</dc:title>
          <dc:type>info:eu-repo/semantics/other</dc:type>
        </oai_dc:dc>
      </metadata>
    </record>
  </GetRecord>
</OAI-PMH>
