Alloying as a strategy to boost the stability of Copper nanocatalysts during electrochemical CO₂ reduction reaction

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{
  "revision": 7, 
  "id": "1589", 
  "created": "2022-12-16T09:12:25.635846+00:00", 
  "metadata": {
    "doi": "10.24435/materialscloud:ft-s8", 
    "status": "published", 
    "title": "Alloying as a strategy to boost the stability of Copper nanocatalysts during electrochemical CO\u2082 reduction reaction", 
    "mcid": "2023.3", 
    "license_addendum": null, 
    "_files": [
      {
        "description": "tar with example inputs + structures", 
        "key": "CuGa.tar.gz", 
        "size": 8291, 
        "checksum": "md5:04296506b300047aeff60f3103fcd082"
      }, 
      {
        "description": "readme file", 
        "key": "readme.txt", 
        "size": 186, 
        "checksum": "md5:6280c40bee11934242ca8918cd237e37"
      }
    ], 
    "owner": 909, 
    "_oai": {
      "id": "oai:materialscloud.org:1589"
    }, 
    "keywords": [
      "Cu", 
      "co2rr", 
      "DFT"
    ], 
    "conceptrecid": "1588", 
    "is_last": true, 
    "references": [
      {
        "type": "Preprint", 
        "comment": "Paper under review - DOI/URL will be added upon acceptance", 
        "citation": "V. Okatenko, A. Loiudice, M. A. Newton, D. Stoian, A. Blokhina, A. N. Chen, K. Rossi, R. Buonsanti"
      }
    ], 
    "publication_date": "Jan 06, 2023, 10:55:04", 
    "license": "Creative Commons Attribution 4.0 International", 
    "id": "1589", 
    "description": "Cu nano catalysts are among the most promising candidates to enable the up-conversion of CO\u2082 by means of electrochemical reduction. Yet, the lack of stability of Cu nano catalysts during electrochemical CO\u2082 reduction reaction represents a strong limiting factor in enabling their widespread use at the industrial level.  The record gathers data related to the theoretical evaluation of the stability and activity of Cu-rich nano catalysts, in the presence of a second metal, namely Ga, whose amount varies between 5% and 30%.", 
    "version": 1, 
    "contributors": [
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Okatenko", 
        "givennames": "Valery"
      }, 
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Loiudice", 
        "givennames": "Anna"
      }, 
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Newton", 
        "givennames": "Mark A."
      }, 
      {
        "affiliations": [
          "Swiss-Norwegian Beamline European Synchrotron Radiation Facility"
        ], 
        "familyname": "Stoian", 
        "givennames": "Dragos C."
      }, 
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Blokhina", 
        "givennames": "Anastasia"
      }, 
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Chen", 
        "givennames": "Alexander N."
      }, 
      {
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Rossi", 
        "givennames": "Kevin"
      }, 
      {
        "email": "Raffaella.buonsanti@epfl.ch", 
        "affiliations": [
          "Institut des Sciences et Ing\u00e9nierie Chimiques, \u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne (EPFL), CH-1951 Sion, Valais, Switzerland"
        ], 
        "familyname": "Buonsanti", 
        "givennames": "Raffaella"
      }
    ], 
    "edited_by": 576
  }, 
  "updated": "2023-01-06T09:55:04.181193+00:00"
}