Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers
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{
"revision": 2,
"id": "2228",
"created": "2024-06-21T08:08:11.542526+00:00",
"metadata": {
"doi": "10.24435/materialscloud:8a-gh",
"status": "published",
"title": "Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers",
"mcid": "2024.92",
"license_addendum": null,
"_files": [
{
"description": "Experimental and modeling data supporting the research work. The corresponding readme files are provided inside the archives.",
"key": "inter_stress.zip",
"size": 9272093,
"checksum": "md5:88ed82cc3e0b973cedbe73418374edf1"
}
],
"owner": 969,
"_oai": {
"id": "oai:materialscloud.org:2228"
},
"keywords": [
"interface stress",
"Cu/W nanomultilayers",
"molecular statics",
"intermixing",
"metastable phases",
"MARVEL/DD1"
],
"conceptrecid": "2227",
"is_last": true,
"references": [
{
"type": "Preprint",
"citation": "Y. Hu, G. Lorenzin, J. Yeom, M. Liyanage, W. Curtin, L. Jeurgens, J. Janczak-Rusch, C. Cancellieri, V. Turlo, to be submitted"
}
],
"publication_date": "Jun 21, 2024, 10:28:44",
"license": "Creative Commons Attribution 4.0 International",
"id": "2228",
"description": "The intrinsic stress in nanomultilayers (NMLs) is typically dominated by interface stress, which is particularly high in immiscible Cu/W NMLs. Here, atomistic simulations with a chemically-accurate neural network potential reveal the role of interfacial intermixing and metastable phase formation on the interface stress levels. These results rationalize an experimentally-reported compressive-to-tensile transition as a function of NML deposition conditions and the extremely high interface stresses under some conditions.",
"version": 1,
"contributors": [
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland",
"National Centre for Computational Design and Discovery of Novel Materials MARVEL, Empa, Thun, Switzerland"
],
"familyname": "Hu",
"givennames": "Yang"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Dubendorf, Switzerland"
],
"familyname": "Lorenzin",
"givennames": "Giacomo"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Dubendorf, Switzerland"
],
"familyname": "Yeom",
"givennames": "Jeyun"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland",
"National Centre for Computational Design and Discovery of Novel Materials MARVEL, Empa, Thun, Switzerland"
],
"familyname": "Liyanage",
"givennames": "Manura"
},
{
"affiliations": [
"School of Engineering, Brown University, Providence, RI 02906 USA",
"National Centre for Computational Design and Discovery of Novel Materials MARVEL, EPFL, Lausanne, Switzerland"
],
"familyname": "Curtin",
"givennames": "William"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Dubendorf, Switzerland"
],
"familyname": "Jeurgens",
"givennames": "Lars"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Dubendorf, Switzerland"
],
"familyname": "Janczak-Rusch",
"givennames": "Jolanta"
},
{
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Dubendorf, Switzerland"
],
"familyname": "Cancellieri",
"givennames": "Claudia"
},
{
"email": "vladyslav.turlo@empa.ch",
"affiliations": [
"Empa - Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland"
],
"familyname": "Turlo",
"givennames": "Vladyslav"
}
],
"edited_by": 576
},
"updated": "2024-06-21T08:28:44.136524+00:00"
}