Published November 13, 2020 | Version v1
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Large mobility modulation in ultrathin amorphous titanium oxide transistors

  • 1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
  • 2. Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States

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Description

Recently, ultrathin metal-oxide thin film transistors (TFTs) have shown very high on-off ratio and ultra sharp subthreshold swing, making them promising candidates for applications beyond conventional large-area electronics. While the on-off operation in typical TFTs results primarily from the modulation of charge carrier density by gate voltage, the high on-off ratio in ultrathin oxide TFTs can be associated with a large carrier mobility modulation, whose origin remains unknown. We investigate 3.5 nm-thick titanium oxide based ultrathin TFTs exhibiting 6-decade on-off ratio, predominantly driven by gate induced mobility modulation. The power law behavior of the mobility features two regimes, with a very high exponent at low gate voltages, unprecedented for oxide TFTs. We find that this phenomenon is well explained by the presence of high-density tail states near the conduction band edge, which supports carrier transport via variable range hopping. The observed two-exponent regimes reflect the bi-exponential distribution of the density of band-tail states. This improved understanding would be significant in fabricating high-performance ultrathin oxide devices.

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References

Journal reference
N. Tiwale, A. Subramanian, Z. Dai, S. Sikder, J. T. Sadowski, C.-Y. Nam, Communications Materials 1, 94 (2020), doi: 10.1038/s43246-020-00096-w